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- Article name
- Planar magnetron use for micron and nanometer thickness ferromagnetic film deposition
- Authors
- Yurkov A. N., , , Prokhorov General Physics Institute, Russian Academy of Sciences, 38 Vavilon str., Moscow, 119991, Russia
Vlasova T. V., , , Prokhorov General Physics Institute, Russian Academy of Sciences, 38 Vavilon str., Moscow, 119991, Russia
Krikunov G. A., , , Prokhorov General Physics Institute, Russian Academy of Sciences, 38 Vavilon str., Moscow, 119991, Russia
Kononov M. A., , , Prokhorov General Physics Institute, Russian Academy of Sciences, 38 Vavilon str., Moscow, 119991, Russia
- Keywords
- magnetron / deposition / ferromagnetic films / sputtering / substrate
- Year
- 2010 Issue 3 Pages 103 - 108
- Code EDN
- Code DOI
- Abstract
- Planar magnetrone with a thick nickel, iron or steel cathode was used for ferromagnetic film deposition on substrates. The cathode was heated up the temperature exceeding the Curie temperature with the use of magnetrone discharges. The measured parameters included current/voltage characteristics, cathode sputtering rates, the rates of film deposition on substrates and film conductivity.
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