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- Article name
- Formation of a cold shield inside for a FPA in the range 3-12 μm
- Authors
- Lopukhin A. A., , orion@orion-ir.ru, Orion R&P Association, 46/2 Enthusiasts highway, Moscow, 111123, Russia
Boltar K. O., , orion@orion-ir.ru, Orion Research-and-Production Association, 9 Kosinskaya str., Moscow, 111402, Russia
Kiseleva L. V., , orion@orion-ir.ru, Orion Research-and-Production Association, 46/2, Enthusiasts road, Moscow, 111123, Russia
Luksha V. I., , orion@orion-ir.ru, Orion Research-and-Production Association, 9 Kosinskava str., Moscow, 111402, Russia
Savostin A. V., , orion@orion-ir.ru, Orion Research-and-Production Association, 9 Kosinskava str., Moscow, 111402, Russia
Povarikhina V. V., , orion@orion-ir.ru, Orion Research-and-Production Association, 9 Kosinskava str., Moscow, 111402, Russia
- Keywords
- diaphragm / photodetector / range / technology / reflection
- Year
- 2010 Issue 3 Pages 116 - 119
- Code EDN
- Code DOI
- Abstract
- Manufacture of focal plane array (FPA) with high performance requires fulfilment of accessories inside a device with minimum reflection coefficients. On a conventional process for this purpose deposition different antireflection coatings (ZnS, ZnSe, darkening) is used. In the given activity thin surfacing of parts from covar was conducted with the purpose of obtaining a fixed roughness for decrease of a mirror reflection in an effective FPA spectral range. With this purpose binary solutions have been designed on the basis of nitric acid. As a result of this design will achieve the minimum reflectivity factor (3÷5 %) over the range lengths of waves 3÷12 μm at etching away of layer thickness no more 70 μm.
- Text
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