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- Article name
- Creation of indium microcontacts by dint of the FPN-20-ISO photoresist in a big integrated circuit reading a photosignal
- Authors
- Batyrev N. I., , , Moscow State Academy of Delicate Chemical Technology named after M. V. Lomonosov, 86 Vernadsky av., Moscow, 119571, Russia
Klimanov E. A., , orion@orion-ir.ru, Orion R&P Association, 46/2 Enthusiasts road, Moscow, 111402, Russia
Liseykin V. P., , orion@orion-ir.ru, Orion R&P Association, 46/2 Enthusiasts road, Moscow, 111402, Russia
Nadrov D. R., , orion@orion-ir.ru, Orion R&P Association, 46/2 Enthusiasts road, Moscow, 111402, Russia
Sednev M. V., , orion@orion-ir.ru, Orion R&P Association, 46/2 Enthusiasts road, Moscow, 111402, Russia
- Keywords
- microcontact / indium / photoresist / step / method
- Year
- 2012 Issue 6 Pages 142 - 144
- Code EDN
- Code DOI
- Abstract
- The explosive method is used for creation of indium microcontacts (step ≤ 30 μm) by using negotiable photoresist. This method lets to a large degree of removing defects, inherent for method of direct photolithography: floating chemical etching by all surface of samples, chemical influence on inferior technological layers, adducing to high density off defects.
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