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- Article name
- PROCESSING OF INFORMATION ABOUT THE PREFERENCES OF THE SEARCH FOR SOLUTIONS REFLECTIVE PHOTOMASK FOR UV-LITHOGRAPHY
- Authors
- Vasin V. A., , vacuumwa@list.ru, Moscow State Institute of Electronics and Mathematics, 3 B. Trekhsvyatitelsky Lane, Moscow, 109028, Russia
IVASHOV E. N., , ienmiem@mail.ru, Moscow State Institute of Electronics and Mathematics, Moscow, Russia
Balan N. N., , , Moscow State Institute of Electronics and Mathematics (Technical University), Russia
Stepanchikov S. V., , ienmiem@mail.ru, Moscow State Institute of Electronics and Mathematics (Technical University), Russia
Korpachev M. Yu., , mkorpachev@gmail.com, Moscow State Institute of Electronics and Mathematics (Technical University), Russia
- Keywords
- information processing in the design / UV-lithography / reflective masks / device for the formation of nanotracks on the substrate / performance improvement
- Year
- 2012 Issue 3 Pages 77 - 86
- Code EDN
- Code DOI
- Abstract
- An analytical model allowing the opportunity to carry out studies of the properties and characteristics of the preferred options and help you choose the direction of the survey designers ultraviolet lithography equipment. Presented by the device using the effect of phase conjugation provides the creation of highly directional beams, which can improve the performance of the application of nanotracks on the substrate.
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