To obtain access to full text of journal and articles you must register!
- Article name
- THE CRITERION OF QUALITY IN COMPUTER-AIDED DESIGN EQUIPMENT FOR IMMERSION LITHOGRAPHY EQUIPMENT
- Authors
- Vasin V. A., , vacuumwa@list.ru, Moscow State Institute of Electronics and Mathematics, 3 B. Trekhsvyatitelsky Lane, Moscow, 109028, Russia
IVASHOV E. N., , ienmiem@mail.ru, Moscow State Institute of Electronics and Mathematics, Moscow, Russia
Balan N. N., , , Moscow State Institute of Electronics and Mathematics (Technical University), Russia
Kostomarov P. S., , , Moscow State Institute of Electronics and Mathematics (Technical University), Russia
Stepanchikov S. V., , ienmiem@mail.ru, Moscow State Institute of Electronics and Mathematics (Technical University), Russia
- Keywords
- computer-aided design / ultraviolet immersion lithography / generalized quality criterion / device for the formation of nanotracks / technological defects of the process
- Year
- 2012 Issue 3 Pages 69 - 77
- Code EDN
- Code DOI
- Abstract
- An approach that allows the selection of the parameters of the new technical solutions, taken as a basis for the establishment of the immersion ultraviolet lithography equipment. Presented by the device that provides the possibility of forming tracks nanometer design rules with no more than 32 μm, and a minimum of technological defect of the process.
- Text
- To obtain access to full text of journal and articles you must register!
- Buy